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Old 05-08-2015, 09:44 AM   #9
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Location: Davis, CA

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Hi Miguel,

the input was 5ul of PhiX at 2 nM. So far we have used 2 nM concentrations for all our libraries/lanes. Illumina recommends up to 3 nM.
From what our FAS told us, I got the impression under-loading could be more detrimental than over-loading.

Quote:
Originally Posted by pmiguel View Post
What final concentration was the phiX library that you clustered? I mean after neutralization?

I mean is there no danger of overclustering anymore? That was what I was hoping for when I heard about the patterned flowcells...

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Phillip
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